摘要
A corrective factor (E,ρ)≤1) dependent on ion energy and mass density of material for energy loss has been introduced into Bethe-Bloch formula, so that the energy deposition process of fast ion penetrating through the allotropic solid films are well discussed with the two-component assumption. An analysis expression of electronic stopping power for different phase structures has been derived from the contribution of "valence" and "core" electrons. The two thirds of inelastic scattering arisen from valence electron was revealed by comparing the theoretical calculation and experimental results on both random and oriented lattice site. The corrective factor representative to the role of inner electrons increases with the projectile energy but decreases with mass density of solids.
A corrective factor (E,ρ)≤1) dependent on ion energy and mass density of material for energy loss has been introduced into Bethe-Bloch formula, so that the energy deposition process of fast ion penetrating through the allotropic solid films are well discussed with the two-component assumption. An analysis expression of electronic stopping power for different phase structures has been derived from the contribution of 'valence' and 'core' electrons. The two thirds of inelastic scattering arisen from valence electron was revealed by comparing the theoretical calculation and experimental results on both random and oriented lattice site. The corrective factor representative to the role of inner electrons increases with the projectile energy but decreases with mass density of solids.
关键词
高能离子
非弹性碰撞
电子停止功率
ELPU (Energy loss per unit length), Electronic stopping power, Valence electron gas, Energetic ion
