摘要
The surface morphological changes produced by Nd:YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning electron microscope. The formation mechanism of the droplets was discussed, and the reasons for formation of the microcracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress, the vapor pressure and the shock pressure induced by the laser supported detonation.
The surface morphological changes produced by Nd:YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning electron microscope. The formation mechanism of the droplets was discussed, and the reasons for formation of the microcracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress, the vapor pressure and the shock pressure induced by the laser supported detonation.
