摘要
A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of sputtering target areaup to 60%. The multipole magnetic field is put in the anode, which makes theunbalanced magnetron atomsource run in a higher discharge current at a lower arcvoltage condition. Meanwhile, the sputtering atoms through out the anode can beionized partially, because the electron reaching the anode have to suffer multiplecollisions in order to advallce across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the secting atoms in film growth andimprove the property of film depositing.
