FELLOW CMOS双层金属工艺的门阵列版图设计系统

FELLOW CMOS Double Metal-Layer Gate Array System

本文详述了CMOS双层金属工艺的门阵列版图设计系统 FELLOW及其系统结构与主要算法.该系统覆盖了门阵列设计中从逻辑网表描述(Netlist)到物理版图(Layout)生成的所有设计阶段.在系统的结构设计上,采用了统一的数据管理和用户界面管理,而使系统模块化、集成化.整个系统与库单元都独立于工艺设计规则,即系统与已建立的单元库可以适用于不同的设计规则.三个芯片设计的实例比较,结果显示其芯片面积比单层布线工艺要减小20％以上.

A CMOS double metal-layer gate array design system,FELLOW, is presented.Thesystem covers the complete layout design stages from netlist description to final physical lay-out. On the system framework, an integrated data management interface and an 'event-driven' human interface are implemented, thus making the system integrated and highly mo-dular. Both the FELLOW system and its logical macro cells are design-rule independent. Thechip area comparison between 3 single metal layer chips and those of the FELLOW systemshowed up to 20％ reduction by using the second metal layer.