摘要
The floating body effect of an asymmetric and Ge implanted partially depleted 0 8μm SOI nMOSFET is investigated.It is found that the drain breakdown voltage can be improved by about 1V and that the anomalous subthreshold slope and kink effect are also lessened.It is believed that the shallow junction in the source and defect states introduced by Ge implantation are responsible for the reduction of the floating body effect.
研究了一种采用非对称结构和注 Ge的部分耗尽 0 .8μm SOI n MOSFET的浮体效应 ,实验结果表明这种结构能够提高漏端击穿电压约 1V,减轻反常亚阈值斜率和 kink现象 .浮体效应的减少是由于源区的浅结和注 Ge引入的晶体缺陷减少了寄生的横向
