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A New Type of Multielements-Doped,Carbon-based Materials Characterized by High-thermoconductiv-ity,Low Chemical Sputtering,Low RES Yield and Exposure to Plasma

A New Type of Multielements-Doped, Carbon-based Materials Characterized by High-thermoconductiv-ity, Low Chemical Sputtering, Low RES Yield and Exposure to Plasma
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摘要 Low-Z materials, such as carbon-based materials and Be, are major plasma-facing material (PFM) for current, even in future fusion devices. In this paper, a new type of multielement-doped carbon-based materials developed are presented along with experimental re-sults of their properties. The results indicate a decrease in chemical sputtering yield by one order of magnitude, a decrease in both thermal shock resistance and radiation-enhanced sublimation, an evidently lower temperature desorption spectrum, and combined properties of exposing to plasma. Low-Z materials, such as carbon-based materials and Be, are major plasma-facing material (PFM) for current, even in future fusion devices. In this paper, a new type of multielement-doped carbon-based materials developed are presented along with experimental re-sults of their properties. The results indicate a decrease in chemical sputtering yield by one order of magnitude, a decrease in both thermal shock resistance and radiation-enhanced sublimation, an evidently lower temperature desorption spectrum, and combined properties of exposing to plasma.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第3期1311-1317,共7页 等离子体科学和技术(英文版)
基金 The work was supported by the National Nature Science Foundation of China No.19789503.
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参考文献10

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