纳米级薄膜厚度自动椭偏测量系统设计

Design on System of Automatic Measuring Thicknessof Nanometer thin Film with Elliptic Polarization

椭圆偏振测量技术特别适于测量纳米级薄膜的厚度和折射率。本文介绍一种新型的反射消光型椭偏薄膜厚度自动测量仪的测量原理和仪器系统设计方法,详细分析了等幅椭圆偏振光的获取方法、椭偏参数测量方法以及仪器结构方面的设计问题,并报道了仪器样机已达到的性能指标。

The measuring technique with elliptic polarization is ingeneral used to measuring thickness and refractive index of nanome-ter film. The measuring principle and design of instrument systemon a new type automatic instrument of measuring thin film bymethod of reflection, extinction and elliptic polarization are intro-duced in the paper. Problems of design for elliptie polarization lightof equal amplitude, structure of instrument and measuring method ofelliptic polarization parameters Ψ ,Δ are analyzed in detail. Thefeatures of our specimen instrument are reposed.