2Alexandre Talbot,Julien Arcamone,Cyril Fellous,Florence Deleglise,Didier Dutartre.??Study of the poly/epi kinetic ratio in SiH 4 based chemistry for new CMOS architectures(J)Materials Science in Semiconductor Processing . 2004 (1)
3Lord S M.Apparatus and method for top removal of granular material from a fluidized bed deposition reactor. 美国, 20080299015 . 2008
4Bathey B.R.,M.C.Cretella,Solar grade silicon.Journal of Materials Science,1982.17:p.3077～3096.
5Ciftja,A.,T.A.Engh,and M.Tangstad,Refining and Recycling of Silicon A Review.2008.
6Takehiko Furasawa.Toshinori Kojima.Hiroyuki Himha,Chemical vapor deposition and homogeneous nucleation in monesilane PYmlysis within interparticle spaces-application of fine formation analysistofluidized bed CVD 1990.
7Hashimoto K.Miura K.and Mosuda M.,Kinetic analysis of the growth of polycrystalline silicon from silane,using a rod-substrate CVD reactor 1992(02).
8Jasinski T J.Childs E.P.,Numerical modeling tools for chemieal vapor deposition,4480 1992.
9Breneman W C.,Flagella R N.and Geston J M,Process for the production of ultra high purity polycrystalline silicon 1989.
