单体结构对基于离子作用的自修复光固化材料性能的影响

Effect of Monomers Structures on Properties of Self-healing Photocured Materials Based on Ion Interaction

本文研究了单体结构及其比例对基于离子作用的自修复光固化材料光聚合行为、力学性能,以及自修复性能的影响。结果表明:改变软硬单体种类及其比例不会改变自修复光固化体系的光聚合行为。增加软单体含量和降低硬单体含量,材料的拉伸应变和修复效率随之增加,断裂应力随之降低。硬单体中刚性环会增加聚合物链间的内摩擦力,使材料断裂应力增加,软单体中柔性醚链则降低链间范德华力,增强链移动性,提高材料的拉伸应变和修复效率。软单体为丙烯酸正丁酯(BA)及硬单体为丙烯酸异冰片酯(IBOA)的样品IB7-BA3展现出较好的综合性能,断裂应力为1.42 MPa,拉伸应变为295%,修复效率高于90%。

In this paper,the effects of soft and hard monomer structures and their proportions on photopolymerization behaviour,and mechanical and self-healable properties of self-healing photocured materials were investigated.The results show that changing the structures and proportions of hard and soft monomers did not change the photopolymerization behaviour of the photocurable self-healing system.Increasing the content of the soft monomer and decreasing the content of the hard monomer can increase the tensile strain and healing efficiency of materials,and decrease the tensile stress.The rigid rings of the hard monomer can increase the internal friction between the polymer chains,thereby increasing the tensile stress of the materials,while the soft monomer containing flexible ether chains can reduce the van der Waals force between the chains and enhance the chain mobility,thereby improving the tensile strain and healing efficiency of the materials.Sample IB7-BA3 with butyl acrylate(BA)and isobornyl acrylate(IBOA)shows good comprehensive performance and its tensile stress,tensile strain and healing efficiency are 1.42 MPa,295%and over 90%,respectively.