摘要
采用电沉积方法制备了Ni/Ag复合镀层,并对电沉积过程及镀层性能进行了研究。结果表明:与纯镍镀层相比,Ni/Al2O3复合镀层的沉积电位发生了正移,约为-0.9 V;Ni/Al2O3复合镀层的电结晶过程符合Scharifker-Hills瞬时成核模型;Ni/Al2O3复合镀层由细小的塔尖状颗粒组成,其平均晶粒尺寸为48.6 nm。
Ni/Al2O3 composite coating was prepared by electrodeposition method?and the electrodeposition process and properties of the coating were studied.The results showed that the deposition potential of Ni/Al2O3 composite coating was about-0.9V,and it was obviously positive relative to pure nickel coating.The electrocrystallization process of Ni/Al2O3 composite coating conforms to the Scharifker-Hills instantaneous nucleation model.The Ni/Al2O3 composite coating was composed of fine spire-like particles,and the average grain size was 48.6 nm.
作者
韩见存
HAN Jiancun(Henan Zhongmei Aluminum Industry Co.,Ltd.,Zhengzhou 452477,China)
出处
《电镀与环保》
CAS
CSCD
北大核心
2019年第5期20-22,共3页
Electroplating & Pollution Control
关键词
电沉积
Ni/Al2O3复合镀层
瞬时成核
electrodeposition
Ni/Al2O3 composite coating
instantaneous nucleation
