介孔二氧化锡薄膜的制备及其氢敏性能研究

Mesoporous SnO2 Thin Film Preparation and Study on Hydrogen Sensitivity Performance

以三嵌段共聚物F127为模板剂,加入浓盐酸抑制水解,通过溶剂挥发诱导自组装,旋涂后在高湿度下干燥制备介孔SnO 2薄膜,并通过掺Pd进一步提高其氢敏性能。利用X射线衍射(XRD)、比表面积与孔径分析和透射电镜(TEM)研究材料的结构与形貌,通过恒流配气法,测试其氢敏性能。结果表明:介孔SnO2粒径约为6.38 nm,比表面积为84.62 m^2/g,孔容为0.174 cm^3/g,平均孔径为5.6 nm。在200℃,对体积分数2×10^-3的H2灵敏度为76,掺杂Pd后提高至191.6,具有优秀的氢敏性能。

Mesoporous SnO2 thin films were prepared via an evaporation-induced self-assembly process with a triblock copolymer F127 as a soft template and concentrated hydrochloric acid to control the hydrolysis.The films were spin-coated and dried under high humidity.The H 2 sensitivity of the film was further enhanced by doped with Pd.The microstructure and morphology of the material were studied by XRD,BET and TEM,and the H2 response characteristics were measured by a constant gas-distribution method.The average size of mesoporous SnO2 particles is 6.38 nm.The specific surface area of the material is 84.62 m^2/g,the pore volume is 0.174 cm^3/g and the average pore size is 5.6 nm.At 200℃,H2 sensitivity of volume fraction 2×10^-3 was 76,which was increased to 191.6 after doping with Pd,showing excellent hydrogen sensitivity.