超疏水光催化协同自清洁表面研究进展

Research Progress of Self-cleaning Surfaces with Combination of Superhydrophobicity and Photocatalytic Property

超疏水光催化自清洁表面同时具有物理自清洁和化学自清洁性能,近年来已成为研究热点。主要介绍了超疏水表面、光催化表面的自清洁原理和制备方法,阐述了超疏水光催化协同自清洁表面的制备原理及其在纺织品基材和其他基材上的研究现状,并展望了超疏水光催化协同自清洁表面的发展前景和趋势。

Superhydrophobic and photocatalytic self-cleaning surface possessing both physical self-cleaning and chemical self-cleaning properties has become an important research focus in recent years.The self-cleaning mechanisms and preparation methods of superhydrophobic surface and photocatalytic surface were introduced.The preparation principles of self-cleaning surface with combination of superhydrophobicity and photocatalytic property and research status of self-cleaning surface on textile substrate and some other substrates were described.The development prospects and trends of superhydrophobic and photocatalytic self-cleaning surfaces were forecasted.