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化学气相沉积反应器共振问题研究与改善

Research and improvement on the resonance of Chemical Vapor Deposition Reactor
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摘要 在生产过程中,化学气相沉积反应器内托负衬底的托盘由马达带动,按设定的转速以托盘中心为轴进行旋转,反应器会在马达和托盘达到某一转速附近时发生剧烈振动,即共振。生产过程中反应器的共振直接影响了衬底上沉积的薄膜质量。文章通过分析和试验,以调整地脚着地力来避开关键工艺转速时产生的共振,以减少产品报废,提高设备寿命。 In the production process, the tray with negative substrate in the Chemical Vapor Deposition Reactor is drivenby the motor and rotates at the center of the tray according to the set rotating speed. The reactor will vibrate violentlywhen the motor and the tray reach a certain speed, that is resonance. The resonance of the reactor directly affects thequality of the thin films deposited on the substrate. Through analysis and test, this paper adjusts the landing force of theground foot to avoid the resonance caused by the key process speed, so as to reduce the scrapping of the product andimprove the service life of the equipment.
作者 陈浩 Chen Hao(Shanghai Jiao Tong University,Shanghai 200030,China)
机构地区 上海交通大学
出处 《江苏科技信息》 2019年第27期42-44,70,共4页 Jiangsu Science and Technology Information
关键词 化学气相沉积 托盘 旋转 共振 Chemical Vapor Deposition carrier rotation resonance
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