聚氨酯电子抛光垫材料的组成及形态结构研究

Study on Composition and Morphological Structure of Polyurethane-based Electronic Polishing Pads

选取了两种用于化学机械抛光的聚氨酯抛光垫,通过红外光谱、差示扫描量热分析(DSC)、热重分析(TGA)及扫描电子显微镜(SEM)等手段研究了两者在组成及形态结构上的区别。结果表明,与国产抛光垫不同,日本产抛光垫在酯醚共聚聚氨酯基体的基础上还添加有氧化锆粒子,并且日本产抛光垫的规整性更好,孔洞尺寸更加均一,研究结果对我国电子抛光产业的发展具有重要意义。

In this paper,two commercialized polyurethane based polishing pads from different countries were selected,and the differences of composition and morphology between two polishing pads were studied by infrared spectroscopy(IR),differential scanning calorimetry(DSC),thermogravimetric analysis(TGA)and scanning electron microscopy(SEM).The results showed that,it was different from the domestic polishing pad that zirconia particles was added to ester ether copolymerized polyurethane matrix for the Japanese polishing pad,and the Japa nese polishing pad had better micro phase structure regularity and more uniform pore size.The research results were of certain significance to the development of electronic polishing industry in China.