溅射功率对二氧化锆薄膜结构及力学性能的影响研究

Effect of Sputtering Power on Structure and Mechanical Properties of Zirconia Films

为了研究溅射功率对二氧化锆薄膜结构及力学性能的影响,使用射频反应磁控溅射技术在常温下以玻璃为基底使用不同功率镀制了800 nm左右的ZrO2薄膜。利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)对样品结晶情况,表面和断面形貌进行表征,结果显示镀制的ZrO2薄膜均为单斜晶体,晶粒尺寸变化不大;随着功率的升高,薄膜从纳米晶结构转变为柱状晶结构。使用纳米压痕仪对薄膜表面进行硬度和弹性模量测试,发现随着功率升高,硬度和弹性模量均出现上升趋势,进一步增加功率出现下降,再上升的变化;在沉积功率为65 W时,可得到厚度为800 nm,弹性恢复量,硬度,弹性模量和塑性指数均最高,分别为88.55%,25.42 GPa,228.6 GPa和0.314的ZrO2薄膜。不同的溅射功率会镀制出不同结构的二氧化锆薄膜,在常温低功率溅射条件下二氧化锆薄膜结构是影响其力学性能的重要因素。

To study the influences of power to the structure and mechanical properties the zirconia films(about 800 nm)which were prepared by RF magnetron sputtering technique with different power were deposited on the glass surface.The results of X-ray diffraction and scanning electron microscope show the zirconia films which have their preferential growth direction are the monoclinic crystal and the grain sizes are not change much.As the power is increased,the structures of zirconia films are transformed into the columnar crystals from the compact nanocrystalline.Then the nano-indenter was used to test the hardness and elastic modulus of the films.It is found that the hardness and elastic modulus increase as the power increased firstly.Then the hardness and elastic modulus decrease and then increase when the power is further increased.The thickness,axial springback value,hardness,elastic modulus and plasticity index of zirconia films deposited at power of 65 W are 800 nm,88.55%,25.42 GPa,228.6 GPa,0.314 respectively.There are different structures of ZrO2 when we change the sputtering power and the structure of ZrO2 is an important factor to the mechanical properties of zirconia films under the condition of the low sputtering power and normal temperature.