化学气相沉积钨中氘热脱附特性的定量分析

Quantitative analysis of thermal desorption of deuterium in chemical vapor deposition tungsten (CVD-W)

利用不同升温速率的热脱附谱法(TDS)研究了化学气相沉积钨(CVD-W)经70 eV/D、1.3×10^25 D/m^2的氘离子辐照后,样品中氘的热脱附特性。结果表明:在该实验条件下,CVD-W中氘滞留总量在10^19 D/m^2量级;氘的脱附温度区间为400~800 K;脱附总量与升温速率呈负相关,且脱附温度区间会随着升温速率提高而向高温区漂移;CVD-W中氘的主要俘获位为位错或晶界,氘的脱附活化能为0.88 eV,缺陷激活能为0.81 eV。

The thermal desorption characteristics of deuterium in chemical vapor deposition tungsten(CVD-W) after irradiation with 70 eV D+ ions to 1.3×10^25 D/m^2 at different heating rates were investigated by thermal desorption spectroscopy(TDS).The results show that under the experimental conditions, the total amount of deuterium retention in the CVD-W is on the order of 10^19D/m^2, the desorption temperature range of the deuterium is 400-800 K, the total desorption amount is negatively correlated with the heating rate, and the desorption temperature range can shift to the high temperature area with the increase of the heating rate. The main trap of the deuterium in the CVD-W is the dislocation or grain boundary, and the thermal desorption energy of deuterium atom is 0.88 eV, the trap-deuterium interaction energy is 0.81 eV.