锰系薄膜磷化工艺的研究

Study on Phosphating Process of Manganese Thin Films

压缩机零件锰系磷化膜层较薄,对磷化工艺参数的控制尤为重要。采用电化学方法,探究了磷化工艺参数总酸度(TA)、表调剂浓度和促进剂浓度对锰系磷化膜耐蚀性的影响,采用扫描电镜(SEM)观察了磷化膜的表面形貌。结果表明:锰系薄膜磷化工艺参数的最佳范围为:总酸度TA=30~35点,表调剂浓度0.10%~0.15%,促进剂浓度1.0 g/L。最优工艺所得磷化膜膜层致密,晶粒大小均匀。

Electrochemical methods were employed to study the effects of total acidity( TA), surface concentration and accelerator concentration on the corrosion resistance of phosphating film,and the surface of the phosphate film was observed by scanning electron microscopy( SEM). Results showed that the optimum parameters of phosphating process for manganese film were 30-35 points of TA,0.10%-0.15% of table concentration and 1.0 g/L of accelerator concentration. The phosphating film obtained under the optimal conditions possessed dense appearance and uniform grain size.