低雾化气压对喷射成形雾化过程的影响

Effect of Low Gas Pressure on Atomization Process of Spray Forming

利用计算流体动力学(CFD)软件Fluent模拟分析低气体压力对雾化过程压力场、速度场和温度场的影响规律,并通过实验验证,为喷射成形雾化过程气体压力参数的选择和实验的可行性研究提供理论依据。结果表明:气体压力为3.0×10^5 Pa时,导流管出口处压力达到极小值,为1.16×10^5 Pa,雾化颗粒200~500μm,初晶Si颗粒3~7μm,雾化效果最佳。当气体压力在2.0×10^5~4.0×10^5 Pa范围内时,气体压力越大,“驻点”的总压力和速度越小,气流交汇处总压力和速度越大,雾化颗粒冷却速度越快。

The effects of the atomization gas pressure on the pressure,velocity and temperature fields were analyzed by Fluent,providing theoretical basis for the selection of pressure parameters and feasible research on experimental in spray forming process.The simulation results show that the pressure at nozzle exit approaches the minimum value of 1.16×10^5 Pa when the gas pressure is 3.0×10^5 Pa.At this condition,atomized particles of 200—500μm and primary Si particles of 3-7μm were got.When the gas pressure is in the range of 2.0×10^5-4.0×10^5 Pa,the total pressure and velocity of the“stagnation”decrease,and the total pressure and velocity of the intersection and the cooling velocity increase with the gas pressure increasing.