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紫外光刻干膜微流控模具制作研究 被引量:1

Research on tabrication of microfluidic die for ultraviolet lithography dry film
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摘要 提出了一种基于感光干膜的微流控模具制作方法。以50μm厚的感光干膜为主要原材料,设计并制作了不同微流道结构的干膜微流控模具。针对紫外曝光和显影主要环节的关键实验参数进行了选择优化。利用该工艺制作的干膜微流控模具,完成了不同结构和功能的微流控芯片的封装及应用。结果表明,与传统光刻微流控模具制作方法相比,干膜微流控模具制备工艺具有操作简单快速、成本低、无需昂贵实验设备和专业操作人员,且制作后的干膜微流控模具边界规则、图形分辨率高,应用效果良好。 In order to simplify the manufacturing process of the microfluidic mold and reduce the cost,a method of manufacturing microfluidic mold based on photosensitive dry film is proposed.With the 50 thick photosensitive dry film as the main raw material,the dry film microfluidic mold with different micro channel structure is designed and made.The key experimental parameters of ultraviolet exposure and development are optimized.The dry film microfluidic die made by this technology has completed the packaging and application of microfluidic chips with different structures and functions.The results show that compared with the traditional method,the dry film microfluidic mold preparation process has the advantages of simple and fast operation,low cost,no expensive experimental equipment and professional operators,and the manufactured dry film microfluidic mold has regular boundary,high graphic resolution and good application effect.
作者 张敏 李松晶 刘航 ZHANG Min;LI Songjing;LIU Hang(School of Mechatronics Engineering,North China Institute of Science and Technology,Langfang 065201,China;School of Mechatronics Engineering,Harbin Institute of Technology,Harbin 150001,China)
出处 《实验技术与管理》 CAS 北大核心 2019年第12期40-43,共4页 Experimental Technology and Management
基金 河北省自然科学基金项目(E2019508105) 中央高校基本科研业务费资助(3142019003)
关键词 干膜 微流控模具 曝光 显影 dry film microfluidic mold exposure developing
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