磁控溅射-电沉积法制备连续泡沫铜工艺

Process for preparation of continuous copper foam by combination of magnetron sputtering and electrodeposition

采用卷状聚氨酯海绵为基体,经80℃烘干、磁控溅射铜导电化、焦磷酸盐电沉积铜和热处理,得到三维孔状结构均匀分布和物理性能良好的连续泡沫铜。

Continuous copper foam with uniform distribution of three-dimensional pore structure and good physical properties was prepared with rolled polyurethane as the substrate by the following procedures:(a) baking at 80℃;(b)metallization by magnetron sputtering of copper;(c) copper electrodeposition in a pyrophosphate bath;and(d) heat treatment.