还原氧化石墨烯中钾离子的电化学嵌入/脱出性能研究

Intercalation/Deintercalation of K^+ in Reduced-Graphene Oxide

采用修正Hammers法成功合成了氧化石墨烯,并且通过热还原的方法成功制备了还原氧化石墨烯.采用SEM和AFM方法表征了该方法合成的氧化石墨烯的形貌以及厚度,发现该氧化石墨烯为厚度约为1 nm、大小为几十微米的不规则片状结构.采用X射线光电子能谱对氧化石墨烯及还原氧化石墨烯进行了C1s和O1s谱线分析,证实该热还原方法还原效果明显.采用电化学方法研究了在还原氧化石墨烯中钾离子的嵌入/脱出行为,发现当电流为100 mA/g时,还原氧化石墨烯的嵌钾容量为120 mAh/g.

Reduced-graphene oxide(RGO)electrodes were prepared by Hammers routes and thermal reduction method.SEM and AFM were employeed to study the morphology and thickness of the as-obtained RGO materials.It was found that the RGO presented an irregularrity flake shape with a thickness of about 1 nm and a size of several micrometers.Also,XPS was employed to analyze the C1s and O1s spectral lines and verify the efficiency of thermal reduction method.Electrochermical method was used to study the intercalation and deintercalation of K+in RGO and it was found that RGO had a K+storage capacity of 120 mAh/g at K+intercalation speed of 100 mA/g.