摘要
半导体微电子技术及其相关产业是我国电子信息行业的重要组成,西方发达国家在该领域对我国始终进行着全方位的封锁。其中,微米级微电子技术的突破,是我国能够独立开展超大规模集成电路研发的重要因素;此外,这一突破还触发了微电子技术在中国的产业化和市场化。基于对原始档案、当事人口述访谈等资料的梳理和分析,再现了我国微米级微电子技术封锁的突破及超大规模集成电路产业化的历程,以及这一过程中所体现出的特殊环境下的技术创新和产学研协作。
Western developed countries have always imposed a comprehensive blockade on China in the field of semiconductors which is an important component of China’s electronic information industry.The breakthrough of micron-scale microelectronics technology is an important motivation for China to independently develop Very-Large-Scale-Integrated circuits.In addition,this breakthrough has also triggered the industrialization and marketization of microelectronics technology in China.Based on the analysis of original archives and oral interview data,it was possible to reconstruct the history of breakthrough of China’s micro-scale microelectronics technology and industrialization,as well as the technological innovation and Industry-college-institute collaboration in a special environment.
作者
王公
Wang Gong(Institute for the History of Natural Sciences,Chinese Academy of Sciences,Beijing 100190,China)
基金
中科院自然科学史研究所“十三五”重大突破项目“中华人民共和国科技史纲”(Y621081)子课题“中华人民共和国信息科学与工程的历史研究”(Y850010003)
关键词
微电子技术
超大规模集成电路
国际封锁
巴黎统筹委员会
李志坚
microelectronic
VLSI
international blockade
Coordinating Committee for Multilateral Export Controls
Li Zhijian