应用于半导体工业的硅外延炉发展历程

Evolution of Silicon Epitaxy Reactor Applied to Semiconductor Industry

随着半导体产业的快速发展,传统的硅抛光片已不能完全满足半导体器件的需求。硅外延片具有质量高、电学性能优越的特点,在分立器件和IC领域已被广泛应用。硅外延片质量的不断提高有赖于外延生长工艺的改进,生长工艺的进步有得益于硅外延炉设计的改进。通过对各个时期出现的硅外延炉的主要技术特点进行讨论,回顾硅外延炉50年来的发展历程,为今后外延炉设计的发展提供参考借鉴。

With the rapid development of semiconductor industry,traditional polished silicon wafer can not meet the demand of semiconductor devices completely.As silicon epitaxial wafers are high-quality and have excellent electrical properties,they have been widely used in fields of discrete devices and IC.The improvement of silicon epitaxial wafer quality depends on the progress of epitaxial process,and the rapid development of process technology strongly relies on the design of silicon epitaxy reactor.The main properties of reactors in different stages are discussed.The evolution of epitaxy reactor in the last 50 years are reviewed to provide reference for the development of epitaxy reactor design in the future.