单晶硅片KOH碱刻蚀工艺研究

Research on KOH Alkaline Etching Process of Monocrystalline Silicon Piece

在太阳能电池片生产工艺中,硅片的清洗和表面处理是重要的工艺步骤。KOH是太阳能行业中常见的一种刻蚀化学品,在硅片预清洗和扩散后背面处理方面有重要作用。在不同的条件下,KOH可以将硅片刻蚀成金字塔状或平整的塔基底座状等。通过研究各种条件下的硅片外观和电池片性能对比,可以找到合适的制程半成品控制要求。对实验过程中发现的黑点异常问题进行了研究对比,找到了导致异常的原因,提出了在电池片生产工艺中减少异常的措施。对目前新发展的添加剂碱刻蚀方式进行调试,摸索出适合金刚线切割单晶硅片扩散后背面处理的工艺参数。

In the production process of solar cell,the cleaning and surface treatment of silicon piece is an important process step.KOH is a common etching chemical in the solar energy industry,which plays an important role in silicon piece pre-cleaning and post diffusion back treatment.Under different conditions,KOH can etch silicon piece into pyramidal or flat tower base.By comparing the appearance of silicon piece and the performance of battery wafer under various conditions,the appropriate control requirements for semi-finished products can be found.This paper studied and compared the black spot abnormal problems found in the experiment,found out the causes of the abnormal,and put forward the measures to reduce the abnormal in the production process of the battery chip.The newly developed additive alkaline etching method was debugged to find out the process para-meters suitable for the back treatment of monocrystalline silicon piece after diffusion.