基体偏压对高功率脉冲磁控溅射AlCrN涂层结构及其性能的影响

Influence of substrate bias on the structure and properties of AlCrN coatings deposited by high power impulse magnetron sputtering

为了获得性能更加优异的刀具涂层,采用高功率脉冲磁控溅射技术(HiPIMS)在Ar/N 2混合气氛下制备了AlCrN涂层,研究了不同基体偏压对于涂层的结构和力学性能的影响.XRD图谱表明:AlCrN涂层中存在立方CrN(200),CrN(220)和六方AlN(110)的衍射峰,其中CrN(220)的衍射峰在偏压大于等于-60 V时才会出现,六方AlN(110)的衍射峰在偏压大于等于-100 V时才会出现;Al元素加入会使所有CrN的衍射峰都向更低的角度偏移.随着基体偏压的升高,涂层表面的大颗粒数量和尺寸都呈现逐渐减小趋势.AlCrN涂层的硬度及弹性模量随着偏压的上升先增加后减小,在偏压为-150 V时均达最大值32.5±2.0 GPa和490±111.0 GPa.随着基体偏压增加,涂层的临界载荷先上升后减小,在偏压为-100 V时有最大值约40 N.

In order to obtain excellent tool coatings,AlCrN coatings were prepared by high power impulse magnetron sputtering(HiPIMS)in an Ar/N 2 mixed atmosphere,and the effects of different substrate bias on the structure and mechanical properties of the coatings were studied.XRD pattern indicates that there are diffraction peaks of cubic CrN(200)(220)and hexagonal AlN(110)in AlCrN,where CrN(220)only appears when the bias is greater than or equal to-60 V,and the diffraction peak of hexagonal AlN(110)only appears when the bias is greater than or equal to-100 V.Moreover,the addition of Al element will shift all the diffraction peaks of CrN to a lower angle.With the increase of substrate bias,the number and size of large particles on the coating surface gradually decreased.The hardness and elastic modulus of the AlCrN coating first increase and then decrease with the increase of the bias voltage.When the bias was-150 V,the maximum values were 32.5±2.0 Gpa and 490±111.0 Gpa.With the increase of substrate bias,the critical load of the coating increases first and then decreases,and the maximum value is about 40 N when the bias is-100 V.