摘要
采用电沉积技术在纯铜片上制备了钴-钨合金薄膜,并研究了钴-钨合金薄膜的磁性能与其厚度、结构及表面形貌等的关系。结果表明:钻鹄电沉积属于诱导共沉积,铸在鉛表面氢原子的催化作用下与钴发生共沉积。钴-钨合金薄膜的厚度约为6um,属于Co3W四面体结构,其表面由典型瘤状颗粒构成。钴-钨合金薄膜垂直方向的磁性能优于平行方向的磁性能,最大矫顽力为74.42 kA/m.
Co-W alloy film was electrodeposited on pure copper sheet,and the relationship between the magnetic property and thickness,structure and surface morphology of Co-W alloy film was investigated.The results showed that the electrodeposition mechanism of Co with W belong to induced co-deposition,and W was co-deposited with Co under the catalysis of hydrogen atoms on the surface of Co.The Co-W alloy film composed of typical nodular particles possessed Co3 W tetrahedron structure with a thickness of 6 pm.The magnetic property of Co-W alloy film in the vertical orientation was better than that in the parallel orientation,and the maximum coercivity was 74.42 kA/m.
作者
廖世芳
刘洋
叶满珠
LIAO Shifang;LIU Yang;YE Manzhu(Xianyang Normal University,Xianyang 712000,China;Shaanxi Railway Institute,Weinan 714000,China)
出处
《电镀与环保》
CAS
CSCD
北大核心
2020年第1期1-3,共3页
Electroplating & Pollution Control
基金
陕西省教育厅哲学社会科学重点研究基地项目(17JZO79)
陕西省教育厅科学研究项目(16JK1828)
咸阳师范学院“青年骨干教师”(XSYGG201717)
咸阳师范学院专项科研基金项目(XSYK18054)
陕西省职业教育研究课题(SZJYB19-215)。
