摘要
目的:基于核径迹图像自动分析TASLIMAGE系统对CR-39固体核径迹探测器在测量氡时的化学蚀刻条件进行研究,以获得最优化的蚀刻条件。方法:采用正交法进行CR-39探测器氡测量实验,分别对测量氡时的蚀刻时间、蚀刻液浓度和蚀刻温度3项条件进行实验,得到净径迹图像和净径迹密度,并基于TASLIMAGE系统与TASL公司推荐的化学蚀刻条件进行比对。结果:通过比较得到测量氡时的最佳蚀刻时间为3 h,NaOH蚀刻液浓度为7 mol·L^-1,蚀刻温度为80℃。在3项影响因素中,蚀刻温度是对净径迹密度影响最明显的因素,影响最小的是蚀刻时间。结论:基于TASLIMAGE系统的化学蚀刻条件研究,能够为CR-39探测器应用于氡测量提供更好的化学蚀刻条件,提高探测准确性。
Objective:To study the chemical etching conditions of CR-39 solid state nuclear track detector(SSNTD)based on automatic analysis TASLIMAGE system of nuclear track image in measuring Radon so as to obtain optimal etching conditions.Methods:In this study,the Radon measurement experiment of CR-39 detector was carried out by orthogonal method.The etching time,the concentration of etching solution and the etching temperature in measuring Radon were tested respectively.And then the net track image and net track density were obtained,and the chemical etching conditions based on TASLIMAGE system were compared with these conditions that were recommended by TASL company.Results:Through comparison,it was found that the optimal etching time was 3 h,and the optimal concentration of NaOH etching solution was 7mol·L^-1,and the optimal etching temperature was 80℃.Among them,the most obvious factor that affected the net track density was the etching temperature,and the least factor was the etching time.Conclusion:The study of chemical etching conditions based on the TASLIMAGE system can provide better chemical etching conditions and improve detection accuracy for CR-39 detector that is used in Radon measurement.
作者
王晨
丁艳秋
邓君
武云云
王恺怡
郭文
WANG Chen;DING Yan-qiu;DENG Jun(Key Laboratory of Radiological Protection and Nuclear Emergency,China CDC,National Institute for Radiological Protection,Chinese Center for Disease Control and Prevention,Beijing 100088,China)
出处
《中国医学装备》
2020年第2期148-152,共5页
China Medical Equipment
基金
科技部科研院所技术开发研究专项(2012EG150137)“多功能被动式个人剂量全自动测量系统的研制”
关键词
CR-39探测器
固体核径迹
氡监测
化学蚀刻
正交法
CR-39 detector
Solid state nuclear track detector(SSNTD)
Radon monitoring
Chemical etching
Orthogonal method