氧化钨（WO3）薄膜光电催化性能的改善及应用

Improvement on the photoelectrocatalytic performance of tungsten oxide （WO3） thin film and its application prospects

半导体WO3具有较小的禁带宽度和良好的稳定性,对可见光具有较强的吸收,在光催化和光电催化领域具有广泛的用途。然而,单一WO3薄膜仍然存在着光生电子-空穴复合率高、光电催化活性与能量转换效率偏低等问题。本文从WO3薄膜光电催化性能的改善及应用两个方面对近年来的研究进行了综述。在WO3薄膜光电催化性能的改善方面,分别从有序纳米结构的构建、离子掺杂与表面修饰进行总结。同时,也归纳总结了WO3薄膜作为光电极在分解水制氢、光电催化还原CO2和降解有机污染物等方面的应用,并提出了WO3薄膜在光电催化过程中存在的问题,指出WO3有序纳米异质结的构建是提高WO3薄膜光电催化活性的有效方法。WO3薄膜光电极的规模制备、廉价助催化剂的使用、光电极的稳定性与耐蚀性是其实际应用过程中需要解决的问题。

Semiconductor WO3 possesses a small band gap,good stability,and strong absorption in visible light region.Thus,it exhibits a wide range of applications in photocatalysis and photoelectrocatalysis.However,there are still some problems for single WO3 thin films,such as high photogenerated electron-hole recombination rate,low photoelectrocatalytic activity and low energy conversion efficiency.In this paper,recent research progress on the photoelectrocatalytic properties of WO3 thin film is reviewed from two aspects of improvement methods and applications.Regarding the former,methods of construction of ordered nanostructures,ion doping and surface modification were summarized.At the same time,the applications of WO3 thin films as photoelectrodes in water decomposition for hydrogen production,photoelectrocatalytic reduction of CO2 and degradation of organic pollutants were concluded.The problems of WO3 thin films in photoelectrocatalytic process were put forward.It is suggested that the construction of ordered nanoheterojunctions is an effective method to improve the photoelectrocatalytic activity of the WO3 thin films.The large-scale preparation of WO3 thin film photoelectrodes,the use of cheap cocatalysts,the stability and corrosion resistance of the photoelectrodes are the difficult problems to be solved in its practical applications.