衬底材料对热蒸发法制备TiO2薄膜的影响

Effect of Substrate Material on TiO2 Film Prepared by Thermal Evaporation

为了探究TiO2薄膜在不同衬底材料上的光学特性和激光损伤阈值,以高阻硅、熔石英和k9玻璃为衬底材料,采用真空热蒸发方法制备TiO2薄膜,利用变角度宽光谱椭偏仪、紫外可见分光光度计和激光损伤测试系统表征不同衬底上薄膜的膜厚、折射率、消光系数、透过率、光学带隙以及激光损伤阈值。研究结果表明:对比3种衬底材料,高阻硅上沉积的TiO2薄膜具有高的折射率和低的消光系数;熔石英上沉积的TiO2薄膜具有高的透过率和宽的光学带隙;k9玻璃上沉积的TiO2薄膜具有窄的光学带隙,熔石英和k9玻璃上TiO2薄膜的激光损伤阈值相差不大。不同衬底上沉积的薄膜结构不同,导致性能不同。

In order to explore the optical properties and laser damage thresholds of TiO 2 films on different substrate materials,TiO 2 films were prepared by vacuum thermal evaporation,with high resistance silicon,fused silica and k9 glass as the substrate materials,respectively.The film thickness,refractive index and extinction coefficient of the thin films on different substrates were analyzed with a variable angle wide spectral ellipsometer,their transmittance and optical band gap were detected by an ultraviolet visible spectrophotometer and their laser damage thresholds on different substrates were measured with a laser damage test system.The results show that by comparing the thin films on the three kinds of substrate material,the TiO 2 film deposited on high resistance silicon has a high refractive index and low extinction coefficient;the TiO 2 film deposited on fused silica has a high transmittance and wide optical band gap;the TiO 2 film deposited on k9 glass has a narrow optical band gap.There is little difference between the laser damage thresholds of the TiO 2 films deposited on fused silica and on k9 glass.The films deposited on different substrate materials are different in structure,thus having different properties.