期刊文献+

基于CMOS图像传感器的彩色滤镜和微透镜工艺研究 被引量:1

Study on Color Filter and Microlens Technology Based on CMOS Image Sensor
下载PDF
导出
摘要 对CMOS图像传感器加工彩色滤镜和微透镜工艺进行深入研究,总结出整个滤镜和微透镜工艺的流程及加工方法。虽然其工艺具有相当的难度,然而平面化和微透镜技术是先进色彩处理技术必须解决和实现的关键问题,所以彩色滤镜的工艺继续开发和研究是非常有积极意义的。 In this paper,the current CMOS image sensor processing color filter and microlens process are deeply studied,and the flow and processing methods of the whole filter and microlens process are summarized.Although the process is quite difficult,planarization and microlens technology are key issues that must be solved and implemented by advanced color processing techniques,so the development and research of color filter processes is very positive.
作者 史海军 叶红波 SHI Haijun;YE Hongbo(Testing Technology Department of Shanghai IC R&D Center,Shanghai 201203,China)
出处 《集成电路应用》 2020年第2期34-36,共3页 Application of IC
基金 国家科技重大专题课题(2011ZX02702_004)
关键词 CMOS图像传感器 像素阵列 彩色滤镜 微透镜 工艺技术 CMOS image sensor pixel array color filter microlens process technology
  • 相关文献

参考文献7

二级参考文献45

  • 1唐雄贵,姚欣,郭永康,杜惊雷,温圣林,刘波,刘倩,董小春.烘焙工艺条件对厚胶光刻面形的影响[J].微细加工技术,2005(3):31-35. 被引量:11
  • 2Gamal A E, Eltoukhy H. CMOS image sensor. IEEE J Circuits Devices Mag, 2005, 21(3): 6.
  • 3Bigas M, Cabruja E, Forest J, et al. Review of CMOS image sensors. Microelectron J, 2006, 37(5): 433.
  • 4Lee P P, Guidash R M, Stevens E G, et al. Active pixel sensor integrated with a pinned photodiode. US Patent, 5625210. 1997.
  • 5Lule T, Benthien S, Keller H, et al. Sensitivity of CMOS based imagers and scaling perspectives. IEEE Trans Electronic Devices, 2000, 47(11): 2110.
  • 6Inoue I, Lhara H, Yamashita H, et al. Low dark current pinned photodiode for CMOS image sensor. IEEE Workshop on CCD's and Advanced Image Sensors, 1999:25.
  • 7Fossum E R. Charge transfer noise and lag in CMOS active pixel sensors. IEEE Workshop CCD's and Advanced Image Sensors, 2003:15.
  • 8Yonemoto K, Sumi H. A numerical analysis of a CMOS image sensor with a simple fixed-pattern-noise-reduction technology. IEEE Trans Electron Devices, 2002, 49(5): 746.
  • 9Endo Y, Nitta Y, Kubo H, et al. 4-μm pixel CMOS image sensor with low-image lag and high-temperature operability. Proc SPIE, 2003, 5017(3): 196.
  • 10Inoue I, Tanaka N, Yamashita H, et al. Low-leakage-current and low-operating-voltage buffed photodiode for a CMOS imager. IEEE Trans Electron Devices, 2003, 50(1): 43.

共引文献24

同被引文献7

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部