退火对磁控溅射AlCrNbSiTiV高熵合金氮化薄膜性能的影响

Effect of annealing on properties of AlCrNbSiTiV high-entropy alloy nitride films prepared by magnetron sputtering

研究了退火温度对磁控溅射AlCrNbSiTiV高熵合金氮化薄膜组织与性能的影响。通过扫描电镜、能谱仪、X射线衍射仪和纳米压痕仪考察了薄膜的形貌、元素含量、物相成分和显微硬度。通过干式切削304不锈钢,考察了镀膜TNMG160404R刀具的刀腹磨损和切削工件的表面粗糙度,比较了退火前后镀膜刀具的切削性能。结果表明:磁控溅射AlCrNbSiTiV高熵合金氮化薄膜的主要是面心立方晶相结构,具有良好的高温稳定性。退火温度为600℃时,薄膜显微硬度高,刀具磨损小,切削工件的表面粗糙度低。

The effect of annealing temperature on microstructures and properties of a magnetron-sputtered high-entropy alloy(AlCrNbSiTiV) nitride thin film was studied. The morphology, elemental composition, phase constitution, and microhardness of the thin film were characterized using scanning electron microscope, energy-dispersive spectrometer, X-ray diffractometer, and nanoindenter. The wear of TNMG160404 R cutter with the thin film after being used to cut 304 stainless steel in dry condition and the roughness of the workpiece after being cut were examined. The cutting performance of the cutter before and after being annealed was compared. The results showed that the magnetron-sputtered AlCrNbSiTiV high-entropy alloy nitride thin film had a face-centered cubic phase structure and good high-temperature stability. When the annealing temperature was 600 ℃, the surface microhardness of the thin film was high, the wear of the cutter was small, and the roughness of the cutting face was low.