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响应曲面法优化微波修复二甲苯污染土壤工艺参数 被引量:4

Optimization of microwave remediation process parameters for xylene contaminated soil by response surface methodology
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摘要 目前土壤污染问题得到越来越多的关注,污染土壤修复技术的研究更加受到重视。通过单因素和响应曲面法优化实验,研究了含水率、处理量、辐照时间和微波功率对二甲苯去除效果的影响,并且对不同敏化剂的作用进行了实验研究。结果表明,微波功率、辐照时间和含水率对二甲苯的去除率均有显著影响。模型优化结果显示,微波修复二甲苯污染土壤的最佳工艺参数为:微波功率530 W,辐照时间3.4 min,含水率32%,去除率可达到79.75%,实验验证结果与预测值之间相对误差为1.89%。活性炭在反应过程中主要起吸附作用,粉煤灰的添加对二甲苯的去除有非常显著的作用,去除率最高可达到98.42%。 At present,more and more attention has been paid to the problem of soil pollution,and the research on remediation technology of contaminated soil has received more attention.In this study,the effects of soil moisture content,treatment volume,irradiation time and microwave power on the removal of xylene were studied by single factor and response surface methodology.The effects of different sensitizers were also studied.The results showed that the microwave power,irradiation time and moisture content had significant effects on the removal rate of xylene.The model optimization results showed that the optimal process parameters for microwave remediation of xylene contaminated soil were the microwave power of 530 W,the irradiation time of 3.4 min and the water content of 32%.The removal rate could reach 79.75%.The relative error between the experimental verification result and the predicted value was 1.89%.Activated carbon mainly played an adsorption role in the reaction process.The addition of fly ash had a very significant effect on the removal of xylene,and the removal rate could reach 98.42%.
作者 周翠红 王世晗 周怡 ZHOU Cuihong;WANG Shihan;ZHOU Yi(Department of Environmental Engineering,Beijing Institute of Petrochemical Technology,Beijing 102617;College of Mechanical and Electrical Engineering,Beijing University of Chemical Technology,Beijing 100029)
出处 《环境污染与防治》 CAS CSCD 北大核心 2020年第3期259-263,共5页 Environmental Pollution & Control
基金 国家自然科学基金青年基金资助项目(No.51104022) 北京市属高等学校人才强教深化计划基金资助项目(No.PHR201107213)
关键词 微波 土壤修复 二甲苯 响应曲面法 粉煤灰 microwave soil remediation xylene response surface methodology fly ash
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