阿比特龙工艺杂质研究

The Research of Process Impurities of Abiraterone

为控制阿比特龙质量,分别以去氢表雄酮和二乙基(3-吡啶基)硼烷为起始物料,经过缩合、碘代、Suzuki偶联反应得到阿比特龙。生产过程中易产生工艺杂质A、杂质B、杂质C、杂质D、杂质E及杂质F,通过核磁及质谱对杂质进行结构确证,并对杂质产生的原因进行分析,为阿比特龙工业化生产提供技术支持。

To control the quality of Abiraterone, dehydroepiandrosterone and diethyl(3-pyridyl) borane were used as starting materials. After condensation, iodine, and Suzuki coupling reactions, abiraterone was obtained. During the production process, process impurities A, B, C, D, E, and F were easily generated. The structure of the impurities was confirmed by NMR and mass spectrometry, and the causes of the impurities were analyzed. It provides technical support for Abiraterone industrial production.