摘要
氧化剂作为抛光液的组成成分,在铝栅化学机械抛光(CMP)中起到直接影响去除速率和表面粗糙度的重要作用。本文研究了氧化剂浓度对去除速率、表面粗糙度、电化学特性的影响,采用原子力显微镜和CHI600E电化学工作站,分别测量了材料的表面粗糙度和腐蚀电位。结果表明,去除速率与氧化剂浓度有关,表面粗糙度与通过氧化反应生成的氧化层有关,当氧化剂达到15mL/L时,去除速率可达到1700 nm/min,表面粗糙度为4.6 nm。
As a component of polishing fluid,oxidant plays an important role in the chemical mechanical polishing(CMP)of aluminum grids,which directly affects the removal rate and surface roughness.In this paper,effects of oxidant concentration on the removal rate,surface roughness and electrochemical characteristics were studied.Surface roughness and corrosion potential of materials were measured by atomic force microscopy and CHI600 E electrochemical workstation.The results showed that the removal rate was related to the oxidant concentration,while the surface roughness was related to the oxidation layer generated by the oxidation reaction.When the oxidant concentration reached 15 mL/L,the removal rate could reach 1700 nm/min and the surface roughness was 4.6 nm.
作者
张金
刘玉岭
闫辰奇
ZHANG Jin;LIU Yuling;YAN Chenqi(Tangshan University,Tangshan 063000,China;Tianjin Key Laboratory of Electronic Materials and Devices,School of electronic and information engineering,Hebei University of Technology,Tianjin 300130,China;Tangshan Normal University,Tangshan 063000,China)
出处
《电镀与精饰》
CAS
北大核心
2020年第1期18-21,共4页
Plating & Finishing
基金
国家中长期科技发展规划02科技重大专项资助项目(2009ZX02308)
唐山市科技计划项目(17110225a)
唐山学院博士创新基金资助项目(tsxybc201805)
唐山师范学院博士基金项目(2018A02)
唐山市科技计划应用基础研究项目(18130231a)。
