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LED光刻机物镜垂向基准变化的影响分析

Impact Analysis on Vertical Datum Change of Projection Lens in LED Stepper
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摘要 物镜是LED光刻机的核心部件,物镜的物面和像面是工件台、掩模台、照明等分系统集成的关键基准。物镜集成时可选用的垂向集成基准有像面、物面、物镜法兰面等。物镜集成基准的变化,会对这些分系统的集成在成本、进度和效率等方面带来影响。需要进行全面分析,来确定具体的影响内容,为规避影响提供依据。基于物镜垂向集成基准从像面变更为物镜法兰面进行影响分析。通过尺寸链分解的方法展开影响分析。根据这两种基准,分别对这些分系统的垂向集成误差建立了尺寸链,根据尺寸链梳理两组间的差异项,再分析差异项在设计、工艺流程、装配等方面的影响。通过分析,给出了物镜基准变更对工件台、掩模台、硅片对准、照明等分系统的具体影响内容。 The projection lens is the core part of the lithography.The best object plane and best focus of the projection lens are the key data for the integration of the wafer stage,the reticle stage,illumination,etc.When the projection lens integrated,the optional vertical integration datum has the best object plane,best focus,the flange surface of the projection lens.The changes on the projection lens datum can have cost,schedule and efficiency implications for these subsystems.It is necessary to conduct a comprehensive analysis to determine the impact and provide a basis for avoiding the impact.This article analyzes the impact of the change from the image surface to the flange surface of the projection lens based on the vertical integration datum.The impact analysis is carried out by the dimension chain.Based on these two data,this paper establishes a dimensional chain for the vertical integration errors of these sub-systems,sorts out the differences between two groups,which are based on the dimensional chain,and then,analyzes the impact of the differences on design,process flow and assembly.Through the analysis, this paper gives the specific content of the influence of the projection lensdatum change on the wafer stage, the reticle stage, wafer alignment, illumination, etc.
作者 陈慧 CHEN Hui(Shanghai Micro Electronics Equipment(Group)Co.,Ltd.,Shanghai 201203,China)
出处 《电子工业专用设备》 2020年第2期43-47,共5页 Equipment for Electronic Products Manufacturing
关键词 光刻机 投影物镜基准 设计变更 影响分析 Lithography Projection lens datum Dimension chain Impact analysis
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