螺旋线镀金薄膜磁控溅射设备的研制

Development of a Magnetron Sputtering Equipment for Helix Gold-Coating

本文详细介绍了用于螺旋线镀金薄膜的磁控溅射设备的研制过程。首先明确了该设备的研制难点,其次对设备的主要组成部分进行了详细的说明,针对设备的几个研制难点提出了解决方案,最后利用研制好的设备进行了膜厚均匀性分析实验。实验表明膜层均匀性良好,达到了预期要求,客户反馈良好。

In this paper, the development process of a magnetron sputtering equipment for helix gold-coating is described in detail. First the difficulties in the development are clarified, then the main components of the equipment are described in detail and the corresponding solutions for the difficulties are proposed, and finally the thickness uniformity analysis of the film made by this equipment is carried out. The analysis result shows that the film has good uniformity and can meet the expected requirement. The customer is satisfied with the equipment.