摘要
羟丙基甲基纤维素(HPMC)具有良好的成膜性能,加入柠檬酸钠(SC)可制备成避光膜,在此基础上利用不同种类的乳化剂包埋油溶性茶多酚(LTP)加入到HPMC基避光膜中制备出HPMC基抗氧化避光膜。运用衰减全反射傅立叶变换红外光谱(ATR FT-IR),广角X射线衍射(XRD),小角X射线散射(SAXS),扫描电子显微镜(SEM)及过氧化值测定等方法研究了复合膜内的分子相互作用,结晶结构,分形结构,形貌结构和抗氧化性能。研究表明,不同的乳化剂种类使得膜材断面结构发生变化,断面孔洞的数量,大小与形状也有了一定程度的改变;影响到HPMC复合膜材内有关CH、—CH 2—及—CH 3官能团的振动收缩;并且能够使得复合膜内HPMC分子链的碰撞和重组从而影响结晶结构的组成和结晶度大小;同时对于体系内油溶性茶多酚的释放产生一定影响。
Hydroxypropyl methylcellulose(HPMC)had good film-forming properties,which could be prepared as a light-proof film by adding sodium citrate(SC).On this basis,different types of emulsifiers embed oil-soluble tea polyphenol(LTP)were added into the HPMC light-proof film to prepare an HPMC-based antioxidant light-proof film.The molecular interaction,supra-molecular structure,morphology,and antioxidant properties of these porous films were studied by attenuated total reflection fourier transform infrared spectroscopy(ATR-FTIR),wide angel X-ray diffraction(XRD),small angle X-ray scattering(SAXS),scanning electron microscope(SEM),and peroxide value test.The study shows that different types of emulsifier could change the cross-sectional structure of the membrane,and the number,size and shape of the cross-section pores also change to some extent.The vibration shrinkage of the CH、—CH 2—and—CH 3 functional groups in the HPMC composite membrane are affected.Moreover,the collision and recombination of the HPMC molecular chain in the composite membrane can affect the composition and crystallinity of the crystal structure.At the same time,it has certain influence on the release of the oil-soluble tea polyphenol in the system.
作者
马颖
陆雨琪
王嘉敏
徐志强
陈阳阳
张良
钱建亚
MA Ying;LU Yu-qi;WANG Jia-min;XU Zhi-qiang;CHEN Yang-yang;ZHANG Liang;QIAN Jian-ya(School of Food Science and Engineering,Yangzhou University,Yangzhou 225127,China)
出处
《塑料工业》
CAS
CSCD
北大核心
2020年第4期134-138,142,共6页
China Plastics Industry
基金
国家自然科学基金青年基金(31901604)
扬州大学大学生创新训练计划项目(x20180853)
扬州大学研究生实践创新项目(XSJCX18_102)。
关键词
羟丙基甲基纤维素
乳化剂
避光膜
微观结构
抗氧化性能
Hydroxypropyl Methylcellulose
Emulsifier
Porous Membrane
Microstructure
Oxidation Resistance