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氯化物三价铬镀铬槽持续出现沉淀故障的处理

Countermeasures for malfunction of continuous precipitation occurred during trivalent chromium electroplating in a chloride-based electrolyte
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摘要 氯化物三价铬镀铬槽中盐酸加入量不够时,碱式硫酸铬分子中的氢氧根不能与盐酸充分反应,导致在生产中三价铬水解,持续生成沉淀物。向镀槽中加浓盐酸10 mL/L调节pH至1.8,24 h后镀液pH升高至2.73,镀槽中没有出现沉淀物,恢复正常生产。 The hydroxyl in basic chromium sulfate molecule did not adequately react with the acid due to the insufficient dosage of hydrochloric acid in a trivalent chromium electroplating bath with chloride as supporting electrolyte,resulting in the continuous formation of precipitates by hydrolysis of trivalent chromium ions.10 mL/L of concentrated hydrochloric acid was added to the electroplating bath to adjust its pH to 1.8,which rose to 2.73 after 24 hours.There was no precipitate in the electroplating bath,and the production returned to normal.
作者 周爱军 郭崇武 ZHOU Aijun;GUO Chongwu(Foshan City Nanhai Gaoyimei Environmental Protection Industry Co.,Ltd.,Foshan 528244,China)
出处 《电镀与涂饰》 CAS CSCD 北大核心 2020年第8期479-480,共2页 Electroplating & Finishing
关键词 三价铬镀铬 碱式硫酸铬 水解 沉淀 故障处理 trivalent chromium electroplating basic chromium sulfate hydrolysis precipitation troubleshooting
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