红外隐身薄膜的优化设计及卷绕式制备技术研究

Design Optimization of Infrared Stealth Multilayer Synthesized in Roll Coating:A Theoretical and Experimental Study

为了抑制军事装备在3~5μm和8~14μm这两个大气窗口内的红外辐射,减小其被红外探测器发现的概率,本文对红外隐身薄膜的优化和制备技术进行了研究。首先选择Ge和ZnS两种材料作为薄膜的组分,然后利用薄膜优化算法对中、远红外隐身薄膜进行优化设计,最终得到14层薄膜结构,它在3~5μm和8~14μm两个波段内的平均反射率均高达90%左右。在此基础上,为了实现规模化制备,本文对真空卷绕式蒸发镀膜技术展开了研究,着重分析了膜料在基底上沉积的均匀性和修正挡板的设计。最后利用光谱仪和热像仪对得到的薄膜进行测试,结果显示其可以明显的降低红中、远红外辐射温度,具有较好的中、远红外隐身能力。

The infrared stealth multilayers were synthesized by electron beam evaporation in roll coating mode on flexible substrate.The influence of the layer-number and thickness of laminated photonic crystal Ge/ZnS components on the reflectance of the infrared stealth multilayer was mathematically modeled,theoretically analyzed in Transfer Matrix Method(TMM)and experimentally evaluated.The average reflectance of the infrared stealth multilayer with 14 layers and optimized thicknesses of Ge/ZnS layers was estimated to be up to 90%in 3~5μm and 8~14μm bands.In addition,the effect of the lab-designed correction mask on the growth uniformity in roll-coating mode was theoretically and experimentally investigated.The results show that the uniformity correction mask makes the difference.The highly uniform mid-infrared and far-infrared stealth multilayers were fabricated by e-beam evaporation in roll coating mode under the optimized deposition conditions.