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通过自由基抑制剂研究聚多巴胺的形成机理 被引量:1

Investigation of Formation Mechanism of Polydopamine by Adding Free Radical Quencher
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摘要 利用自由基抑制剂二甲基亚砜(DMSO)与依达拉奉(Edaravone)研究了多巴胺(DA)聚合中可能存在的自由基聚合路径,并考察了pH值对聚合过程的影响.利用紫外-可见光谱跟踪了反应过程.研究结果表明,DMSO和Edaravone均可抑制DA的聚合,而且Edaravone的抑制作用更加显著.研究结果表明,自由基聚合路径存在于DA的聚合过程中.实验还发现,DA的聚合速率随着pH值的升高而增大,但不同pH值时溶液的最终外观基本一致. In this paper,by using dimethyl sulfoxide(DMSO)and edaravone as the free radical quencher,the free radical polymerization pathways of dopamine under different pH conditions were studied.Besides,the absorbance of the dopamine solutions was characterized by means of UV-Vis spectroscopy.It is found that the dopamine polymerization rate decreases with the increase of the DMSO concentration,indicating that DMSO can slow down the polymerization of dopamine.Further experiments show that edaravone can slow down the polymerization of dopamine more significantly.These results indicate that the free radical polymerization is one of the possible pathways of dopamine polymerization.Although DMSO can slow down the polymerization of dopamine,it cannot completely restrain the polymerization,which indicates that the polymerization has other reaction pathways besides the free radical polymerization.These pathways may be the main reason for the structure complexity of polydopamine.Moreover,it is found that the polymerization rate increases with the increase of pH and the final reaction products under different pH conditions are similar.
作者 王倩颖 崔树勋 WANG Qianying;CUI Shuxun(Key Laboratory of Advanced Technologies of Materials,Ministry of Education,Southwest Jiaotong University,Chengdu 610031,China)
出处 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2020年第6期1378-1383,共6页 Chemical Journal of Chinese Universities
基金 国家自然科学基金(批准号:21774102)资助.
关键词 多巴胺 聚合机理 自由基抑制剂 自由基聚合 Dopamine Mechanism of polymerization Free radical quencher Free radical polymerization
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  • 1王欢,叶小鹤,陈黎明,陆嘉星,何鸣元.离子液体中间硝基苯酚在玻碳电极上的电化学还原行为研究[J].高等学校化学学报,2005,26(2):326-329. 被引量:42
  • 2Hwang S.,Lee J.,Kwak J..J.Electroanal.Chem.[J],2005,579(1):143-152.
  • 3Mostafavi M.,Keghouche N.,Delcourt M.O..Chem.Phys.Lett.[J],1990,169(1/2):81-84.
  • 4Luce B.M.,Foulke G..In Modern Electroplating[M],New York:Wiley Press,1974:381.
  • 5Innocenzo G.C.,Michela C..Journal of the Electrochemical Society[J],2007,154(12):D697-D702.
  • 6Teresa L..Electrochimica Acta[J],2008,53(19):5725-5731.
  • 7Lee H.,Dellatore S.M.,Miller W.M.,Messersmith P.B..Science[J],2007,318:426-430.
  • 8DiPaola A.,Augugliaro V.,Palmisano L.,Pantaleo G.,Savinov E..Journal of Photochemistry and Photobiology A:Chemistry[J],2003,155(1-3):207-214.
  • 9Hu S.S.,Xu C.L.,Wang G.P.,Cui D.F..Talanta[J],2001,54(1):115-123.
  • 10Forryan C.L.,Compton R.G..Physical Chemistry Chemical Physics[J],2003,5(19):4226-4230.

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