摘要
介绍了一种接近接触式光刻机对准工作台找平机构,该机构采用三点找平,容易找平,找平力小,找平时不损伤掩模版和基片涂胶面。结构简单,性能稳定可靠,维修方便。
A kind of leveling mechanism is introduced for the alignment worktable of the proximity contact lithography machine.The leveling mechanism adopts three-point leveling,which is easy to level with small leveling force,and does not damage the mask and the substrate coating surface.The structure is simple,with stable and reliable performance,and maintenance convenient.
作者
周占福
ZHOU Zhanfu(The 45th Research Institute of CETC,Beijing 100176,China)
出处
《电子工业专用设备》
2020年第3期47-49,共3页
Equipment for Electronic Products Manufacturing
关键词
三点找平
光刻机
找平力
楔形误差补偿
Three-point leveling
Lithography machine
Leveling force
Wedge error compensation