Ni/NiO网上PbO2薄膜的制备

Preparation of PbO2 on Ni/NiO mesh substrate

本文采用阳极电沉积法在预氧化的Ni网上制备了PbO2薄膜,利用SEM与XRD对PbO2薄膜进行微观表征,探究了不同沉积工艺下PbO2的薄膜形貌变化:(1)在不同电沉积电势下PbO2膜的形貌变化;(2)在不同占空比下PbO2膜的形貌变化;(3)在不同电沉积时间下PbO2膜的形貌及厚度。并得到了最优的沉积参数,沉积电压为2.4 V、占空比为0.5。该条件下得到的PbO2膜均匀性与覆盖率最好,为后期在污水处理方面提供了PbO2薄膜制备技术参考。

In this paper,PbO2 thin films were prepared on pre-oxidized Ni mesh by anodic electrodeposition.Microscopic characterization of PbO2 thin films was performed using SEM and XRD.The morphology changes of PbO2 thin films under different deposition processes were investigated:(1)morphology changes of PbO2 films under different electrodeposition potentials;(2)morphology changes of PbO2 films under different duty cycles;and(3)morphology and thickness changes of PbO2 films under different electrodeposition times.The best PbO2 film with good homogeneous and coverage was obtained under the deposition potential of 2􀆰4 V and the duty cycle of 0􀆰5.The works supply a reference for the PbO2 film preparation in later sewage treatment process.