摘要
对C276镍铬合金基带进行电化学抛光后,采用磁控溅射技术制备中间层或过渡层,然后通过金属有机物化学气相沉积法制备Y-Ba-Cu-O高温超导层。考察了抛光电流对抛光带表面粗糙度、中间层或过渡层面内织构度数和超导层的临界电流的影响。确定了合适的基带抛光电流范围为60~100 A,最佳为90 A。
A high-temperature Y–Ba–Cu–O superconductor strip was prepared by metal–organic chemical vapor deposition on C276 nickel–chromium alloy substrate electrochemically polished and magnetron sputtered with intermediate or transition layer.The effect of polishing current on surface roughness of the polished substrate,in-plane texture of the middle layer or transition layer,and critical current of the superconducting layer were studied.The appropriate polishing current was determined in a range from 60 A to 100 A,and 90 A was recommended.
作者
夏金成
李小宝
熊旭明
张爱兵
蔡渊
XIA Jincheng;LI Xiaobao;XIONG Xuming;ZHANG Aibing;CAI Yuan(Suzhou Advanced Materials Research Institute Co.,Ltd.,Suzhou 215123,China)
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2020年第11期714-717,共4页
Electroplating & Finishing
关键词
第二代高温超导体
钇钡铜氧
电化学抛光
表面粗糙度
织构
临界电流
second-generation high-temperature superconductor
electrochemical polishing
surface roughness
texture
critical current