摘要
电驱动功率模块能够采用的一种微纳米尺度加工新技术是聚焦离子束,该技术对半导体器件能够进行微区溅射与增强刻蚀,能够在分辨率优于0.1 nm条件下对样品特定微区进行无需掩模的精确刻蚀;能够对样品表面进行薄膜沉积,便于裸芯片截面加工、导电性差或不导电样品的SEM形貌观察;能够进行裸芯片截面加工及观察,有效结合裸芯片截面研磨工艺实现三代半导体材料工艺器件截面加工技术的全覆盖;能够进行半导体材料改性及器件研制,具有无需掩模版和感光胶层并简化工艺流程等优点。
A new nano scale processing technology developed by the Electric Driving Power Module is Focused Ion Beam,and the technology can be used for micro area sputtering and enhanced etching,and can accurately etch the specific micro area of the sample without mask under the condition that the resolution is better than 0.1 nm which used Focused Ion Beamtechnology.It can be used for thin film deposition on the surface of the sample,so as to facilitate the processing of chip cross-section,SEM morphology observation of poor conductive or non-conductive samples.It can be used for bare chip cross-section processing and the cross section processing technology of three generations of semiconductor material process devices and can be fully covered by the effective combination of bare chip cross section processing technology.The semiconductor material modification and device research can be carried out,with the advantages of no mask and photoreceptor layer and simplified the process flow,etc.
作者
曹德峰
刘伟良
刘鹏飞
陈致初
陈建明
陈磊
曾润东
CAO De-feng;LIU Wei-liang;LIU Peng-fei;CHEN Zhi-chu;CHEN Jian-min;CHEN Lei;ZENG Run-dong(Zhuzhou CRRC Times Electronic Co.,Ltd.,Zhuzhou 412001)
出处
《环境技术》
2020年第3期203-207,211,共6页
Environmental Technology
关键词
功率模块
聚焦离子束
离子注入
溅射
增强刻蚀
power module
focused ion beam
ion implantation
sputtering
enhanced etching