氢辅助脉冲直流溅射沉积的碳化硼薄膜的红外光学性质与机械性质的研究

Infrared optical and mechanical properties of boron carbide thin films deposited by hydrogen-assisted pulsed DC sputtering

采用氢气为辅助气体,在不同氢气流速下用微波等离子体辅助脉冲直流磁控溅射系统制备碳化硼薄膜。碳化硼薄膜的设计厚度为1200 nm,过渡层非晶硅的设计厚度为500 nm。所用的基板为载玻片、Ge、Si、Si wafer、GaAs和JGS3。之后,采用傅里叶红外光谱(FT-IR),X射线衍射(XRD)、维氏硬度计(Vicker indenter),分析了氢气流速(0、3、7和10 mL/min)对碳化硼薄膜的光学性质和机械性质的影响。结果表明,氢气流速的增加,可以明显提高红外光学透过率,降低红外光光吸收率。与此同时,氢气的增加还能降低薄膜应力,使薄膜易于附着在基底上。然而,氢气也会使得碳化硼薄膜硬度降低。

In this study,boron carbide thin films were deposited by microwave plasma-assisted pulsed DC sputtering system with hydrogen as reactive gas at different hydrogen flow rates.The design thickness of boron carbide thin film was 1200 nm,and the design thickness of transition layer amorphous Si was 500 nm.The substrates used were microslides,Ge,Si,Si wafer,GaAs and JGS3.Then,Fourier infrared spectroscopy(FT-IR),X-ray diffraction(XRD)and Vicker indenter were used to analyze the effects of hydrogen flow(0,3,7 and 10 mL/min)on the optical and mechanical properties of boron carbide thin films.As the results,the infrared optical transmittance and absorption rate could be improved by increasing the flow rate of hydrogen.At the same time,the increase of hydrogen could also reduce the stress of the coating,making it easy to adhere to the substrate.However,hydrogen reduced the hardness of boron carbide thin films.