摘要
分别以MCM-41和甲基丙烯酸(MAA)作为基体和功能单体,合成了铑离子表面印迹聚合物Rh-IIP-MAA/MCM-41和相应的非印迹聚合物NIP-MAA/MCM-41,并进行结构表征。然后将Rh-IIP-MAA/MCM-41作为吸附剂,用来吸附溶液中低浓度的铑离子,对吸附过程进行条件优化和分析,找出了Rh-IIP-MAA/MCM-41吸附铑离子的最佳条件。
The rhodium ion surface imprinted polymer Rh-IIP-MAA/MCM-41 and corresponding non-imprinted polymer NIP-MAA/MCM-41 were synthesized with MCM-41 and MAA as matrix and functional monomer respectively,and their structures were characterized.Then the Rh-IIP-MAA/MCM-41was used as adsorbent to adsorb low concentration rhodium ions in the solution.The conditions of the adsorption process were optimized and analyzed.The optimum conditions for Rh-IIP-MAA/MCM-41 to adsorb rhodium ions were found.
作者
黎先财
郑嵩
田明磊
LI Xiancai;ZHENG Song;TIAN Minglei(College of Chemistry,Nanchang University,Nanchang 330031,China)
出处
《南昌大学学报（理科版）》
CAS
北大核心
2020年第2期143-147,共5页
Journal of Nanchang University(Natural Science)
基金
国家自然科学基金资助项目(51664042)。
