摘要
高纯三氟化硼是半导体离子注入用的重要掺杂离子源,在电子工业中有着广泛的应用。介绍了三氟化硼常用的制备方法及其优缺点,列举了三氟化硼的纯化方法。在实际生产过程中,企业可根据自身的情况选择合理的生产路线,结合三氟化硼粗品的杂质种类,选择合适的纯化方法,得到高纯度的三氟化硼产品。
The high-purity boron trifluoride is the important doping ion source for semiconductor on implantation, and it has a wide application in electronics industry. In this paper, common preparation methods of boron trifluoride and their advantages and disadvantages are introduced, the purification methods of boron trifluoride are listed. In the actual production process, the enterprise need to choose a reasonable production route according to its actual situation, then select the appropriate purification method on the basis of the impurities types in the preparation process to obtain high-purity boron trifluoride products.
作者
缪光武
白占旗
曾群
张金柯
何双材
刘武灿
MIAO Guangwu;BAI Zhanqi;ZENG Qun;ZHANG Jinke;HE Shuangcai;LIU Wucan(Zhejiang Research Institute of Chemical Industry Co.,Ltd.,State Key Laboratory of Fluorinated Greenhouse Gases Replacement and Control Treatment,Hangzhou 310023,China)
出处
《有机氟工业》
CAS
2020年第2期43-47,共5页
Organo-Fluorine Industry
关键词
三氟化硼
制备
纯化
boron trifluoride
synthesis
purification