ICP-OES法测量核电厂二回路水中的二氧化硅

ICP-OES Method for Measuring Silicon Dioxide in the Secondary Circuit of Nuclear Power Plant

核电厂二回路二氧化硅含量是电厂水质控制中定期监测的重要项目。目前,对于二氧化硅的测量,各大电厂均采用紫外-可见分光光度法。分光光度法分析二氧化硅过程复杂、耗时、人为误差大、检测限高,无法满足痕量二氧化硅的快速准确测量。本文采用电感耦合等离子体发射光谱法(ICP-OES)来测量核电厂二回路水中的二氧化硅。该方法具有操作简单、分析快速、结果准确、检测限低等优点。结果表明,二氧化硅标准曲线线性相关系数大于0.999,加标回收率97.9%~101.8%,相对标准偏差0.91%(n=7),方法检测限可达1.3μg·kg-1。

In the secondary circuit of nuclear power plant,the periodic measurement of silicon dioxide is very important for water chemistry control of the power plant.Now,almost all power plants are using ultraviolet and visible spectrophotometer to measure silicon dioxide.The spectrophotometry of measuring silicon dioxide is very complex and time-consuming.In addition,man-made big error and high method detection limits are also shortages of spectrophotometry.So,the spectrophotometery cannot meet the fast and accurate measurement requirements of trace-level silicon dioxide.In this study,ICP-OES is used to measure silicon dioxide of the secondary circuit in nuclear power plant.This method is simple to operate,rapid to analyze,accurate of the results and low limit of detection.Experimental results show that the coefficient correlation of standard curve of silicon dioxide can be greater than 0.999;the standard addition and relative standard deviation are 97.9%to 101.8%and 0.91%(n=7)respectively;the methoddetection limit is 1.3μg·kg-1.