摘要
利用图像处理方法对比研究了单波长辐照和双波长激光同时辐照下熔石英光学元件的损伤增长阈值。通过实时采集损伤图像和靶面光斑能量空间分布,获取损伤增长发生位置对应的能量密度。针对3ω单独辐照、3ω和1ω同时辐照下熔石英元件损伤增长的实验数据,比较分析了基于图像处理方法和传统损伤增长阈值R-on-1测量方法(国标)所得结果的差异。结果表明:本文采用的图像处理方法在研究小口径非均匀光斑辐照下的熔石英光学元件损伤增长阈值时,能解决传统损伤阈值测试中将能量密度分布非均匀光斑等效为均匀分布的平顶光斑带来的计算误差问题,有助于降低损伤(增长)阈值测量中的光斑口径效应。
The damage growth threshold of fused silica optical elements under single-wavelength irradiation and dual-wavelength laser irradiation was studied based on image processing methods. Through real-time acquisition of the damage image and the spot spatial energy distribution, the energy density at the location where the damage growth occurs was obtained. Aiming at the experimental data of the damage growth of fused silica optical elements under 3 ω irradiation, 3 ω and 1 ω simultaneous irradiation, the differences between the results obtained by the image processing method and the traditional damage growth threshold R-on-1 measurement method(GB) were compared and analyzed. The results show that the image processing method used in this paper can solve the calculation error problems caused by the traditional method that the non-uniform spot with energy density distribution is equivalent to the flat top spot with uniform distribution when the damage of fused silica optical element increases under the nonuniform spot of small aperture irradiation, and reduce the effect of light spot caliber in damage(growth) threshold measurement.
作者
李翠
史晋芳
邱荣
叶成
郭德成
蒋勇
Li Cui;Shi Jinfang;Qiu Rong;Ye Cheng;Guo Decheng;Jiang Yong(School of Manufacturing Science and Engineering,Key Laboratory of Testing Technology for Manufacturing Process of Ministry of Education,Southwest University of Science and Technology,Mianyang 621010,China;Joint Laboratory for Extreme Conditions Matter Properties,Southwest University of Science and Technology,Mianyang 621010,China)
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2020年第8期20-25,共6页
High Power Laser and Particle Beams
基金
国家自然科学基金委员会与中国工程物理研究院联合基金项目(U1530109)
国家自然科学基金项目(11972313)。
关键词
激光诱导损伤增长阈值
熔石英
双波长
小口径非均匀光斑
图像处理
laser-induced damage growth threshold
fused silica
dual-wavelength
non-uniform spot of small aperture
image processing