碱腐蚀工艺对微通道板性能的影响研究

Micro-channel Plate Etching Technology in Lye

本文探究了微通道板腐蚀工艺中碱溶液的腐蚀时间对其增益的影响。利用X射线光电子能谱分析仪和原子力显微镜,测试了不同碱腐蚀时间作用后微通道板通道内壁碱金属元素的含量变化情况,以及通道内壁粗糙度变化趋势。结果表明,在不影响微通道板通道内壁粗糙度的情况下,一定程度上减少碱腐蚀时间可以降低微通道板通道内壁的碱金属元素的流失,从而提高通道内部二次电子发射能力,提高微通道板增益。微通道板电性能以及制管后产品增益和噪声性能结果表明,减少碱腐蚀时间,并未增加制管后噪声系数,而通过提高微通道板内表面碱金属的含量,有助于制管增益的提高。

In this study,the effect of lye corrosion time on the gain of a microchannel plate is investigated.By adjusting the lye-etching time,the concentration of alkali metals and the roughness of the channel inner wall are visualized via X-ray photoelectron spectroscopy and atomic force microscopy.Results show that reducing the lye-etching time can reduce the loss of alkali metal elements in the inner wall of the microchannel plate without affecting its roughness,thereby improving the secondary electron emission capacity and the microchannel plate gain.Further tests show that higher alkali metals can improve the gain of both the microchannel plates and image intensifier tubes,whereas the noise coefficient in the image intensifier tube does not increase with reduced lye-etching time.